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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">vsgiu</journal-id><journal-title-group><journal-title xml:lang="ru">Вестник Сибирского государственного индустриального университета</journal-title><trans-title-group xml:lang="en"><trans-title>Bulletin of the Siberian State Industrial University</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2304 - 4497</issn><issn pub-type="epub">2307-1710</issn><publisher><publisher-name>Федеральное государственное бюджетное образовательное учреждение высшего образования "Сибирский государственный индустриальный университет"</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">vsgiu-341</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Металлургия и материаловедение</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>Metallurgy and Materials Science</subject></subj-group></article-categories><title-group><article-title>ЗАВИСИМОСТЬ МИКРОТВЕРДОСТИ ОТ СОДЕРЖАНИЯ ЛЕГИРУЮЩИХ ЭЛЕМЕНТОВ В МОДИФИЦИРОВАННОМ СЛОЕ СПЛАВА AL – 11SI – 2CU, ПОДВЕРГНУТОГО ЭЛЕКТРОННО-ПЛАЗМЕННОМУ ЛЕГИРОВАНИЮ</article-title><trans-title-group xml:lang="en"><trans-title>DEPENDENCE OF MICROHARDNESS ON THE CONTENT OF ALLOYING ELEMENTS IN THE MODIFIED LAYER OF AL – 11SI – 2CU ALLOY SUBJECT TO ELECTRON-PLASMA ALLOYING</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Бутакова</surname><given-names>К.А.</given-names></name><name name-style="western" xml:lang="en"><surname>Butakova</surname><given-names>K.A.</given-names></name></name-alternatives><email xlink:type="simple">vestnicsibgiu@sibsiu.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Осинцев</surname><given-names>К.А.</given-names></name><name name-style="western" xml:lang="en"><surname>Osintsev</surname><given-names>K.A.</given-names></name></name-alternatives><email xlink:type="simple">vestnicsibgiu@sibsiu.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Загуляев</surname><given-names>Д.В.</given-names></name><name name-style="western" xml:lang="en"><surname>Zagulyaev</surname><given-names>D.V.</given-names></name></name-alternatives><email xlink:type="simple">vestnicsibgiu@sibsiu.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Коновалов</surname><given-names>С.В.</given-names></name><name name-style="western" xml:lang="en"><surname>Konovalov</surname><given-names>S.V.</given-names></name></name-alternatives><email xlink:type="simple">vestnicsibgiu@sibsiu.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Громов</surname><given-names>В.Е.</given-names></name><name name-style="western" xml:lang="en"><surname>Gromov</surname><given-names>V.E.</given-names></name></name-alternatives><email xlink:type="simple">gromov@physics.sibsiu.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Сибирский государственный индустриальный университет</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Siberian State Industrial University</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Самарский национальный исследовательский университет имени академика С.П. Королева</institution><country>Russian Federation</country></aff><aff xml:lang="en"><institution>Samara National Research University named after Academician S.P. Korolev</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2020</year></pub-date><pub-date pub-type="epub"><day>29</day><month>07</month><year>2025</year></pub-date><volume>0</volume><issue>1</issue><fpage>44</fpage><lpage>48</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Бутакова К., Осинцев К., Загуляев Д., Коновалов С., Громов В., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Бутакова К., Осинцев К., Загуляев Д., Коновалов С., Громов В.</copyright-holder><copyright-holder xml:lang="en">Butakova K., Osintsev K., Zagulyaev D., Konovalov S., Gromov V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://vestnik.sibsiu.ru/jour/article/view/341">https://vestnik.sibsiu.ru/jour/article/view/341</self-uri><abstract><p>Выполнены исследования микротвердости, элементного и фазового состава сплава Al – 11Si – 2Cu, подвергнутого электронно-плазменному легированию, которое заключалось в электрическом взрыве проводника из титана с порошковой навеской Y2O3 и последующем высокоскоростном нагреве при помощи воздействия интенсивного импульсного электронного пучка. Установлено существенное увеличение микротвердости поверхностных слоев сплава. Характеризующая толщину модифицированного слоя глубина проникновения легирующих элементов составила приблизительно 170 мкм. Слой материала (5 мкм), наиболее близко примыкающий к поверхности модифицирования, характеризуется максимальной (155 ± 15,5 HV) микротвердостью. Интенсивное снижение микротвердости начинается с расстояния 110 мкм от поверхности и на расстоянии 170 мкм микротвердость достигает исходных значений 85,9 ± 8 HV. Сравнительный анализ изменений микротвердости с концентрацией легирующих элементов в поверхностном слое сплава показывает, что увеличение микротвердости явным образом связано с присутствием в модифицированном слое титана и иттрия.</p></abstract><trans-abstract xml:lang="en"><p>The microhardness, elemental and phase composition of the Al – 11Si – 2Cu alloy subjected to electron-plasma alloying, which consisted of an electric explosion of a titanium conductor with a powder charge of Y2O3 and subsequent high-speed heating using an intense pulsed electron beam, were studied. A significant increase in the microhardness of the surface layers of the alloy was found. The penetration depth of the alloying elements, characterizing the thickness of the modified layer, was approximately 170 μm. The material layer (5 μm), most closely adjacent to the modification surface, is characterized by the maximum (155 ± 15.5 HV) microhardness. An intensive decrease in microhardness begins at a distance of 110 μm from the surface and at a distance of 170 μm the microhardness reaches the initial values of 85.9 ± 8 HV. A comparative analysis of changes in microhardness with the concentration of alloying elements in the surface layer of the alloy shows that the increase in microhardness is clearly associated with the presence of titanium and yttrium in the modified layer.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>сплав Al – 11Si – 2Cu</kwd><kwd>электронно-плазменное легирование</kwd><kwd>поверхность</kwd><kwd>микроструктура</kwd><kwd>микротвердость</kwd></kwd-group><kwd-group xml:lang="en"><kwd>Al – 11Si – 2Cu alloy</kwd><kwd>electron-plasma alloying</kwd><kwd>surface</kwd><kwd>microstructure</kwd><kwd>microhardness</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Whalen S., Olszta M., Roach C., Darsell J., Graff D., Reza-E-Rabby Md., Roosendaal T., Daye W., Pelletiers T. Mathaudhu S., Overman N. 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